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Liu, Shi-Yong Zeng, Xiang-Bo Peng, Wen-Bo Yao, Wen-Jie Xie, Xiao-Bing Yang, Ping Wang, Chao Wang, Zhan-Guo Zeng, X.-B.([email protected])
The plasma enhanced chemical vapor deposition(PECVD) system was used for fabricating the silicon films with different hydrogen dilution ratio(RH) under the high power density, high pressure and low substrate temperature. High-resolution transmission electron microscopy(HRTEM) and Raman spectroscopy indicated that the thin films were nanocrystalline...
Hao, Hui-Ying Li, Wei-Min Zeng, Xiang-Bo Kong, Guang-Lin Liao, Xian-Bo Hao, H.-Y.
A series of transition films from amorphous to microcrystalline silicon was successfully prepared by very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD).Effects of gas pressure on the microstructure, photoelectric and transport properties of the films were investigated.The results indicate that increase of gas pressure improve ...
