Plasma-induced sub-10 nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethan...
Two-dimensional (2D) Au-SnO2-In2O3 heterostructures with thickness less than 10.0 nm were fabricated on 4 inch Si/SiO2 wafers by the plasma-enhanced atomic layer deposition (PE-ALD) technique as functional electrodes for electrochemical ethanol sensors. Structural, morphological and electrochemical characteristics of the developed 2D samples were s...
