Synthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using ...
Silicon carbonitride thin films have been deposited by plasma enhanced chemical vapor deposition (PECVD) from bis(dimethylamino) dimethylsilane (BDMADMS) as a function of X=(BDMADMS/(BDMADMS+NH3)) between 0.1 and 1, and plasma power P (W) between 100 and 400 W. The microstructure of obtained materials has been studied by SEM, FTIR, EDS, ellipsometr...
