Reports on the kinetics of the autoxidation of aqueous nitric oxide are discussed. It is concluded that the correct rate law is -d[NO]/dt = 4kaq[NO]2[O2] with kaq = 2 x 10(6) M-2.s-1 at 25 degrees c and that a recent report of a rate law zero order in NO is incorrect.
Plasma etching is an important step in microelectronics device production. The by-products of etching reactions are gases of unknown chemical composition and toxicity. The research-project was undertaken to characterize health hazards resulting from these waste products. The study included chemical analyses and toxicological investigations. The com...
SIGLE / Available from TIB Hannover: F96B1526+a / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische Informationsbibliothek / Bundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany) / DE / Germany
The peripheral blood lymphocytes isolated from workers of different exposure situations - (1) plasma etching industry, (2) final chlorination of polyvinylchloride and (3) synthesis of monochlorodimethylether - and control subjects were examined for chromosomal mutations, sister chromatid exchanges, gene mutations and DNA-adducts. After careful cons...
The study confirms that a combination of uv irradiation and H_2O_2 addition represents a suitable option for the treatment of landfill percolation water after a first biological waste water treatment. An additional oxygen supply facility is not required. The stable purification performance is proved by following the oxygen demand, pH and temperatur...
SIGLE / Available from TIB Hannover: RR 91(36) / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische Informationsbibliothek / DE / Germany