Rider, Gavin C.
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
This paper explains how an electric field and a reticle interact and describes the different kinds of damage that can be caused to a reticle through its exposure to electric field. It is shown why electrostatic reticle damage has changed from ESD damage (which causes yield to suddenly drop precipitously) into a gradual and cumulative form of degrad...
Ma, Ling Wu, Qiang Dong, Lisong Li, Qiaoqiao Wei, Yayi Ye, Tianchun
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
With the continuous shrinking of semiconductor manufacturing technology node, the pattern size has become smaller and the pattern density has become higher. This can cause the lithography defects to be more difficult to remove, because the developing fragments have a larger relative surface area, and thus more sticky to the patterned substrate surf...
Chang, Tien-Chan Liao, Chun-An Lin, Zhi-Yu Fuh, Yiin-Kuen
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
Thermal interface material (TIM) is a key component to dissipate the accumulated heat in the majority of power electronic systems. In this work, a facile and solid-state ball-milling method is adopted for the solvent-free reduction of exfoliated graphite nanoplatelets (EGNs) into high-quality ball-milled exfoliated graphite nanoplatelet (BMEGN) fil...
Ngunjiri, Johnpeter Meyers, Gregory Cameron, Jim Suzuki, Yasuhiro Jeon, Hyun Lee, Dave Choi, Kwang Mo Kim, Jung Woo Im, Kwang-Hwyi Lim, Hae-Jin
...
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
This paper reports on our studies of the dynamic process of positive tone photoresist development in real time. Using high-speed atomic force microscopy (HS-AFM) in dilute alkaline developer solution, changes in morphology and nanomechanical properties of patterned resist were monitored. The Bruker Dimension FastScan AFM was used to analyze 193-nm ...
Mao, Yanjie Li, Sikun Sun, Gang Duan, Lifeng Bu, Yang Wang, Xiangzhao
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
In optical lithography tools, thermal aberration of a projection lens, which is caused by lens heating effect, leads to degradation of imaging quality. In addition to in-line feedforward compensation technology, thermal aberration can be reduced by optimizing optical design of a projector. Thermal aberration analysis of a projection lens benefits t...
Rhie, Jiyeah Lee, Dukhyung Bahk, Young-Mi Jeong, Jeeyoon Choi, Geunchang Lee, Youjin Kim, Sunghwan Hong, Seunghun Kim, Dai-Sik
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
Atomic layer deposition is an efficient method for coating a few nanometer-thick alumina over a wafer scale. This method combined with the standard photolithography process was presented to fabricate metallic nanometer gaps that optically act in terahertz regimes. However, the cross-sectional view of the gap shape of the metal–insulator–metal nanog...
Han, Wenbo Chen, Xueye Hu, Zengliang Yang, Kun
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
With MEMS technology developing rapidly, the microfluidic droplet technology has been employed into many biological or chemical experiments. To satisfy the increasingly high demands in various applications of the microfluidic chips, the size of the droplet needs accurate control. We have designed and performed a three-dimensional numerical simulati...
Wang, Xiren Granik, Yuri
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
In modern integrated circuit (IC) fabrication processes, the photoresist receives considerable illumination energy that is reflected by underlying topography during optical lithography of implantation layers. Bottom antireflective coating (BARC) is helpful to mitigate the reflection. Often, however, BARC is not used, because its removal is technica...
Mukherjee, Banibrata Swamy, Kenkere Balashanthamurthy Mruthyu... Sen, Siddhartha
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
This paper investigates the effect of dynamic excitation and its utility for enhancement of stable displacement range for a double cantilever-based electrostatic microactuator. A coupled electromechanical problem has been formulated using Galerkin method and solved considering dynamic actuation. The effect of excitation frequency is analyzed thorou...
Syed Mohammed, Zishan Ali Puiu, Poenar Daniel Aditya, Sheel
Published in
Journal of Micro/Nanolithography, MEMS, and MOEMS
Low resistance is an important requirement for microcoils which act as a signal receiver to ensure low thermal noise during signal detection. High-aspect ratio (HAR) planar microcoils entrenched in blind silicon trenches have features that make them more attractive than their traditional counterparts employing electroplating through a patterned thi...
