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Tailoring two-dimensional nanoparticle arrays into various patterns

Authors
  • Sun, Jinling
  • Wang, Ying
  • Liao, Jianhui
Publication Date
Jan 26, 2018
Source
Institutional Repository of Institute of Process Engineering, CAS (IPE-IR)
Keywords
License
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Abstract

A simple and effective technique has been developed to fabricate patterns of nanoparticle arrays. Lithographically fabricated structures in resists serve as scissors to tailor two-dimensional nanoparticle arrays on a flat poly(dimethylsiloxane) (PDMS) stamp. The desired patterns of nanoparticle arrays remaining on the PDMS stamp after tailoring can be printed onto solid substrates. Various regular nanoparticle patterns, such as squares, triangles, disks, and pentagons, can be easily prepared using this technique. Arbitrary nanoparticle patterns as complex as Chinese characters have been successfully demonstrated. Moreover, nanoparticle stripes with width ranging from micrometers to quasi single nanoparticle diameter have also been achieved. Nanoparticle stripes have been integrated into electronic devices for transport measurements.

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