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Surface characteristics of SiO2-TiO2 strip fabricated by laser direct writing

Authors
  • ak, li
  • wang, zm
  • liu, jj
  • zeng, xy
  • wang, cx
  • chen, hd
  • univ, li ak r huazhong
Publication Date
Jan 01, 2008
Source
Gallica, Bibliothèque Numérique
Keywords
License
Unknown
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Abstract

SiO2-TiO2 sol-gel films are deposited on SiO2/Si by dip-coating technique. The SiO2-TiO2 strips are fabricated by laser direct writing using all ytterbium fiber laser and followed by chemical etching. Surface structures, morphologies and roughness of the films and strips are characterized. The experimental results demonstrate that the SiO2-TiO2 sol-gel film is loose in Structure and a shrinkage concave groove forms if the film is irradiated by laser beam. The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time. But the roughness of laser irradiated area increases more than that of non-irradiated area under the same etching time. After being etched for 28 s, the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.

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