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Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent

Authors
Type
Published Article
Journal
Journal of the Ceramic Society of Japan
Publisher
Ceramic Society of Japan
Publication Date
Aug 04, 2019
Volume
127
Identifiers
DOI: 10.2109/jcersj2.19017
Source
MyScienceWork
License
Green

Abstract

Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method.

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