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Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization

  • Kuck, H.
  • Reinecke, H.
  • Dimov, S.
  • Wu, S.
  • Klein, M. J. K.
  • Vazquez-Mena, O.
  • Auzelyte, V.
  • Savu, V.
  • Blondiaux, N.
  • Montagne, F.
  • Heinzelmann, H.
  • Pugin, R.
  • Brugger, J.
Publication Date
Jan 01, 2011
Infoscience @ EPFL
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We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and aluminum anodization. Using a serial top-down EBL technique we exploit a fine size, positioning and flexibility of this tool. NSL and aluminum anodization, as self-organized bottom-up processes, guaranties cost efficiency and throughput. In our work, we have fabricated silicon nitride (SiN) and alumina (Al(2)O(0)3) membranes with a thickness down to 100 nm, side length ranging from 200 mu m up to 2.4 mm and pore size ranging from 20 nm to 500 nm.

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