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<i>In situ</i> analysis of nucleation reactions during TiCl<sub>4</sub>/H<sub>2</sub>O atomic layer deposition on SiO<sub>2</sub> and H-terminated Si surfaces treated with a silane small molecule inhibitor

Authors
  • Clerix, Jan-Willem J;
  • Dianat, Golnaz;
  • Delabie, Annelies; 7140;
  • Parsons, Gregory N;
Publication Date
May 01, 2023
Source
Lirias
Keywords
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Unknown
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status: published

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