Affordable Access

Access to the full text

Single-step electrodeposition of superhydrophobic black NiO thin films

Authors
  • Bahramian, A.1
  • Eyraud, M.1
  • Vacandio, F.1
  • Hornebecq, V.1
  • Djenizian, T.2
  • Knauth, P.1
  • 1 Aix Marseille Univ, CNRS, Madirel, UMR 7246, Electrochemistry of Materials Group, Campus St Jérôme, Marseille, 13013, France , Marseille (France)
  • 2 Mines Saint-Etienne, Department of Flexible Electronics, Center of Microelectronics in Provence, Gardanne, 13541, France , Gardanne (France)
Type
Published Article
Journal
Journal of Applied Electrochemistry
Publisher
Springer Netherlands
Publication Date
Apr 04, 2019
Volume
49
Issue
6
Pages
621–629
Identifiers
DOI: 10.1007/s10800-019-01305-2
Source
Springer Nature
Keywords
License
Yellow

Abstract

AbstractBlack finished surfaces have extensive applications in many domains, such as optics, solar cells, and aerospace. The single-step electrodeposition of superhydrophobic black NiO films from a dimethyl sulfoxide-based electrolyte is described in this paper. The physicochemical properties of the obtained film were characterized using scanning electron microscopy, X-ray diffraction, and electrochemical tests (electrochemical impedance spectroscopy and potentiodynamic polarization). A rough surface with a low reflection of light was formed after the deposition process that increased the contact angle of water from about 87° (for bare Cu) to 163° (in presence of the black coating), which improved the corrosion resistance of the Cu substrate by about 30%. The formed black NiO film revealed a notably high stability and kept its appearance even after corrosion tests.Graphical Abstract

Report this publication

Statistics

Seen <100 times