Affordable Access

Silica and alumina thin films grown by liquid phase deposition

Authors
  • Sun, J
  • Hu, LZ
  • Wang, ZY
  • Du, GT
Publication Date
Jan 01, 2005
Source
Knowledge Repository of SEMI,CAS
Keywords
License
Unknown
External links

Abstract

This work demonstrates the condition optimization during liquid phase deposition (LPD) Of SiO2/GaAs films. LPD method is further applied to form Al2O3 films on semiconductors with poison-free materials. Proceeding at room temperature with inexpensive equipment, LPD of silica and alumina films is potentially serviceable in microelectronics and related spheres.

Report this publication

Statistics

Seen <100 times