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Rapid thermal annealing properties of ZnO films grown using methanol as oxidant

Authors
  • Zhang PF (Zhang, P. F.)
  • Liu XL (Liu, X. L.)
  • Wei HY (Wei, H. Y.)
  • Fan HB (Fan, H. B.)
  • Liang ZM (Liang, Z. M.)
  • Jin P (Jin, P.)
  • Yang SY (Yang, S. Y.)
  • Jiao CM (Jiao, C. M.)
  • Zhu QS (Zhu, Q. S.)
  • Wang ZG (Wang, Z. G.)
Publication Date
Jan 01, 2007
Source
Knowledge Repository of SEMI,CAS
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Abstract

ZnO thin films were grown by metal-organic chemical vapour deposition using methanol as oxidant. Rapid thermal annealing (RTA) was performed in an ambient of one atmosphere oxygen at 900 degrees C for 60 s. The RTA properties of the films have been characterized using scanning electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, photoluminescence spectra and Hall measurement. The grains of the film were well coalesced and the surface became denser after RTA. The full-width at half maximum of rocking curves was only 496 arcsec. The ZnO films were also proved to have good optical quality. The Hall mobility increased to 43.2 cm(2) V-1 s(-1) while the electron concentration decreased to 6.6 x 10(16) cm(-3). It is found that methanol is a potential oxidant for ZnO growth and the quality of ZnO film can be improved substantially through RTA.

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