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Growth and properties of high index Ta2O5 optical coatings prepared by HiPIMS and other methods

Authors
  • Hála, M.
  • Vernhes, R.
  • Zabeida, O.
  • Bousser, E.
  • Klemberg-Sapieha, J.E.
  • Sargent, R.
  • Martinu, L.1, 2
  • 1 Department of Engineering Physics, Thin Film Research Center – GCM, Polytechnique Montreal
  • 2 JDSU
Type
Published Article
Journal
Surface and Coatings Technology
Publisher
Elsevier
Publication Date
Jan 01, 2013
Volume
241
Pages
33–37
Identifiers
DOI: 10.1088/0022-3727/43/40/405303
Source
Elsevier
Keywords
License
Unknown

Abstract

•Amorphous Ta2O5 films are prepared under various sputtering power delivery conditions.•HiPIMS-deposited films display high refractive index, low roughness and low stresses.•Some of the films properties are comparable with those of dense thermally-grown Ta2O5.•The film properties are interpreted in terms of discharge and plasma characteristics.

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