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Photocatalytic patterning and modification of graphene.

Authors
  • Zhang, Liming
  • Diao, Shuo
  • Nie, Yufeng
  • Yan, Kai
  • Liu, Nan
  • Dai, Boya
  • Xie, Qin
  • Reina, Alfonso
  • Kong, Jing
  • Liu, Zhongfan
Type
Published Article
Journal
Journal of the American Chemical Society
Publisher
American Chemical Society
Publication Date
Mar 02, 2011
Volume
133
Issue
8
Pages
2706–2713
Identifiers
DOI: 10.1021/ja109934b
PMID: 21291276
Source
Medline
License
Unknown

Abstract

TiO(2)-based photocatalysis has been widely used to decompose various organic pollutants for the purpose of environmental protection. Such a "green" photochemical process can ultimately degrade organic compounds into CO(2) and H(2)O under ambient conditions. We demonstrate here its extended application on the engineering of single- or few-layer graphene. Using a patterned TiO(2) photomask, we have achieved various photochemical tailorings of graphene, including ribbon cutting, arbitrary patterning on any substrate, layer-by-layer thinning, and localized graphene to graphene oxide conversion. UV-visible spectroscopic studies indicate that the photogenerated, highly reactive ·OH radicals work as sharp chemical scissors. Being a solution-free, cost-effective, scalable, and easy handling technique, the presented photocatalytic patterning and modification approach allows for the versatile design and fabrication of graphene-based devices and circuits, compatible with current microelectronic technology, as demonstrated by this fabricated all-carbon field effect transistor (FET) array.

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