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Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes.

Authors
Type
Published Article
Journal
Beilstein Journal of Nanotechnology
2190-4286
Publisher
Beilstein-Institut
Publication Date
Volume
5
Pages
234–244
Identifiers
DOI: 10.3762/bjnano.5.25
PMID: 24778944
Source
Medline
Keywords
  • Atomic Layer Deposition
  • Conformal Coating Guidelines
  • Continuum Diffusion Model
  • Titania, Tio2
  • Vertically Aligned Carbon Nanotubes

Abstract

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