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Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes.

Authors
  • Yazdani, Nuri
  • Chawla, Vipin
  • Edwards, Eve
  • Wood, Vanessa
  • Park, Hyung Gyu
  • Utke, Ivo
Type
Published Article
Journal
Beilstein Journal of Nanotechnology
Publisher
Beilstein-Institut
Publication Date
Jan 01, 2014
Volume
5
Pages
234–244
Identifiers
DOI: 10.3762/bjnano.5.25
PMID: 24778944
Source
Medline
Keywords
License
Unknown

Abstract

Many energy conversion and storage devices exploit structured ceramics with large interfacial surface areas. Vertically aligned carbon nanotube (VACNT) arrays have emerged as possible scaffolds to support large surface area ceramic layers. However, obtaining conformal and uniform coatings of ceramics on structures with high aspect ratio morphologies is non-trivial, even with atomic layer deposition (ALD). Here we implement a diffusion model to investigate the effect of the ALD parameters on coating kinetics and use it to develop a guideline for achieving conformal and uniform thickness coatings throughout the depth of ultra-high aspect ratio structures. We validate the model predictions with experimental data from ALD coatings of VACNT arrays. However, the approach can be applied to predict film conformality as a function of depth for any porous topology, including nanopores and nanowire arrays.

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