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Micro/nano machining of polymeric substrates by ion beam techniques

Authors
  • W He
  • D.B Poker
  • K.E Gonsalves
  • N Batina
Journal
Microelectronic Engineering
Publisher
Elsevier
Publication Date
Jan 01, 2003
Volume
65
Identifiers
DOI: 10.1016/s0167-9317(02)00847-x
Keywords

Abstract

Abstract Ion beam lithography was studied as an alternative approach for micro/nano machining of polymeric substrates. Our preliminary study was carried out using poly(methyl methacrylate) (PMMA) as a model system. Spin cast PMMA films were submitted to masked Ca + ion implantation (85 keV, 1×10 14 ions/cm 2), and P + ion implantations (85 keV, 1×10 15 and 1×10 16 ions/cm 2 respectively). The patterns generated on the films were characterized by AFM as arrays of holes with nanoscale depth and microscale width. The effect of ion implantation on surface property was investigated by measuring surface hydrophobicity. The results showed that masked ion beam lithography can change not only the surface topography, but also the surface hydrophobicity.

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