Germany
Metallorganisch chemische Gasphasenabscheidung (MOCVD) von oxidischen hoch-#epsilon# Schichten Authors Regnery, S. technische, rheinisch-westfaelische juelich, forschungszentrum Publication Date Jan 01, 2005 Source OpenGrey Repository Keywords 20K - Solid-State Physics Atomic Force Microscopy Barium Compounds Chemical Vapor Deposition Crystal Growth Frequency Dependence Hafnium Oxides Hz Range Khz Range 01-100 Khz Range 100-1000 Layers Leakage Current Mixing Nucleation Organometallic Compounds Permittivity Platinum Scanning Electron Microscopy Silicon Strontium Titanates Substrates Tantalates Temperature Dependence Temperature Range 0400-1000 K Thickness Thin Films Titanium Oxides Transmission Electron Microscopy X-Ray Diffraction Zirconium Oxides Language German License Unknown External links Full record on hdl.handle.net Abstract Germany