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Longitudinal optic phonon-plasmon coupling in delta-doped metamorphic InAlAs/InGaAs high-electron-mobility transistor structures on GaAs substrates

Authors
  • jiang, cp
  • huang, zm
  • zf, li
  • yu, j
  • guo, sl
  • lu, w
  • chu, jh
  • cui, lj
  • zeng, yp
  • zhu, zp
  • wang, bq
Publication Date
Jan 01, 2001
Source
Knowledge Repository of SEMI,CAS
Keywords
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Abstract

InAlAs/InGaAs metamorphic high-electron-mobility transistor structures with different spacer layers on GaAs substrates are characterized by Raman measurements. The influence of In0.52Al0.48As spacer thickness on longitudinal optic phonon-plasmon coupling is investigated. It is found that the intensity of GaAs-like longitudinal optic phonon, which couples with collective intersubband transitions of two-dimensional electron gas, is strongly affected by the different subband energy spacings, subband electron concentrations, and wave function distributions, which are determined by different spacer thicknesses. (C) 2001 American Institute of Physics.

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