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Ionic polishing of optical surfaces.

Authors
Type
Published Article
Journal
Applied Optics
0003-6935
Publisher
The Optical Society
Publication Date
Volume
5
Issue
6
Pages
1031–1034
Identifiers
DOI: 10.1364/AO.5.001031
PMID: 20049004
Source
Medline

Abstract

The controlled removal of material from the surface of insulators has been observed by using a positive ion beam. In the energy range 0.5-2.0 MeV the sputtering yield was observed to be unity. The application of this technique to the manufacture of high quality optical surfaces is discussed.

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