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Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching.

Authors
  • Abe, Takashi
  • Hung, Vu Ngoc
  • Esashi, Masayoshi
Type
Published Article
Journal
IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control
Publisher
Institute of Electrical and Electronics Engineers
Publication Date
Jul 01, 2006
Volume
53
Issue
7
Pages
1234–1236
Identifiers
PMID: 16889329
Source
Medline
License
Unknown

Abstract

In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.

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