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Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4

Authors
  • Kast, Daniel
  • Franz, Gerhard
  • Senkevich, Jay J.
Type
Published Article
Journal
Royal Society Open Science
Publisher
The Royal Society
Publication Date
Apr 14, 2021
Volume
8
Issue
4
Identifiers
DOI: 10.1098/rsos.201921
PMID: 33996121
PMCID: PMC8059661
Source
PubMed Central
Keywords
Disciplines
  • Research Articles
License
Unknown

Abstract

In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between different reaction parameters and solvents is drawn by means of thermal, laboratory-scale and microwave-assisted reactions and quantitative nuclear magnetic resonance (qNMR) studies.

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