Affordable Access

deepdyve-link
Publisher Website

High diffraction-efficiency molybdenum gratings for EUV lithography

Authors
  • Menouer Saidani
  • Harun H. Solak
Journal
Microelectronic Engineering
Publisher
Elsevier
Publication Date
Jan 01, 2009
Volume
86
Identifiers
DOI: 10.1016/j.mee.2009.02.019
Keywords

Abstract

Abstract Two generations of transmission molybdenum gratings are realized; the first one made with laser interference lithography (LIL) has 300 nm period and the second one made with extreme UV interference lithography (EUV-IL) using the first one has 150 nm period. This technique is a good alternative to e-beam lithography which inevitably introduces field-stitching errors into the gratings. The idea is to produce a first defect-free grating using LIL and to realize higher resolution gratings by multiplying the frequency of this first grating using EUV-IL. Measurements over a wavelength range that includes the industry standard 13.5 nm show the attainment of diffraction efficiency close to the theoretically expected value of 29% for these phase-gratings.

Report this publication

Statistics

Seen <100 times