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Health risks caused by plasma etching processes in the semiconductor industry Final report / Gesundheitliche Risiken durch Plasmaaetzprozesse in der Halbleiterindustrie Schlussbericht

Authors
  • Bauer, S.
  • Wolff, I.
  • univ., leipzig
  • Halle-Wittenberg Univ., Halle (Germany)....
  • Halle-Wittenberg Univ., Halle (Germany)....
  • Halle-Wittenberg Univ., Halle (Germany)....
Publication Date
Jan 01, 1995
Source
OpenGrey Repository
Keywords
Language
German
License
Unknown

Abstract

Plasma etching is an important step in microelectronics device production. The by-products of etching reactions are gases of unknown chemical composition and toxicity. The research-project was undertaken to characterize health hazards resulting from these waste products. The study included chemical analyses and toxicological investigations. The complex mixtures of halogenated hydrocarbons were analysed and conditions and pathways of their creation were clarified. Animal experiments and in vitro-tests showed clear genotoxic effects in all used test systems, as well as significant adverse effects on prenatal development in laboratory mice. Precautionary measures for protection of the staff and handling the wastes are recommended in the report. (orig.) / SIGLE / Available from TIB Hannover: F95B2342+a / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische Informationsbibliothek / Bundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany) / DE / Germany

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