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GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration

Authors
  • wang, xl
  • sun, dz
  • kong, my
  • hou, x
  • zeng, yp
  • chinese, xl r wang
Publication Date
Jan 01, 1997
Source
Knowledge Repository of SEMI,CAS
Keywords
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Unknown
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Abstract

InxGa1-xAs/InP (0.39 less than or equal to x less than or equal to 0.68) strained-layer quantum wells having 20 wells with thickness of 50 Angstrom in a P-i-N configuration were grown by gas source molecular beam epitaxy (GSMBE). High-resolution X-ray diffraction rocking curves show the presence of up to seven orders of sharp and intense satellite reflection, indicative of the structural perfection of the samples. Low-temperature photoluminescence and low-temperature absorption spectra were used to determine the exciton transition energies as a function of strain. Good agreement is achieved between exciton transition energies obtained experimentally at low temperature with those calculated using the deformation potential theory.

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