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Growth Behavior of High Density Al2O3 Layer Prepared by Using Cyclic Chemical Vapor Deposition Technology.

Authors
Type
Published Article
Journal
Journal of Nanoscience and Nanotechnology
1533-4880
Publisher
American Scientific Publishers
Publication Date
Volume
15
Issue
7
Pages
5232–5237
Identifiers
PMID: 26373113
Source
Medline

Abstract

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