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Field-induced carrier delocalization in the strain-induced Mott insulating state of an organic superconductor

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Preprint
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DOI: 10.1103/PhysRevLett.103.116801
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arXiv
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Abstract

We report the influence of the field effect on the dc resistance and Hall coefficient in the strain-induced Mott insulating state of an organic superconductor $\kappa$-(BEDT-TTF)$_{2}$Cu[N(CN)$_{2}$]Br. Conductivity obeys the formula for activated transport $\sigma_{\Box} = \sigma_{0}\exp(-W/k_{B}T)$, where $\sigma_{0}$ is a constant and $W$ depends on the gate voltage. The gate voltage dependence of the Hall coefficient shows that, unlike in conventional FETs, the effective mobility of dense hole carriers ($\sim1.6\times 10^{14}$ cm$^{-2}$) is enhanced by a positive gate voltage. This implies that carrier doping involves delocalization of intrinsic carriers that were initially localized due to electron correlation.

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