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Selective etching of YBCO targets by ion — plasma sputtering

Authors
Journal
Applied Superconductivity
0964-1807
Publisher
Elsevier
Publication Date
Volume
1
Identifiers
DOI: 10.1016/0964-1807(93)90278-a

Abstract

Abstract Single-phase ceramics YBa 2Cu 3O 7 produced by the solid-state sintering and used as a target at ion-plasma deposition of films was studied by the X-rays analysis, optical microscopy and microhardness measurement. Following changes occurred in the target during its use: 1. 1-grains having the < 00 1 > orientation along the normal to the surface of the target were predominantly etched away by sputtering from the surface of the target; 2. 2 — Y 2BaCuO 5 compound appeared; 3. 3 — nonuniform distribution of oxygen appeared along the cross-section of the target.

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