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Fabrication of silicon nanowire arrays by macroscopic galvanic cell-driven metal catalyzed electroless etching in aerated HF solution.

Authors
  • Liu, Lin
  • Peng, Kui-Qing
  • Hu, Ya
  • Wu, Xiao-Ling
  • Lee, Shuit-Tong
Type
Published Article
Journal
Advanced Materials
Publisher
Wiley (John Wiley & Sons)
Publication Date
Mar 05, 2014
Volume
26
Issue
9
Pages
1410–1413
Identifiers
DOI: 10.1002/adma.201304327
PMID: 24323873
Source
Medline
Keywords
License
Unknown

Abstract

Macroscopic galvanic cell-driven metal catalyzed electroless etching (MCEE) of silicon in aqueous hydrofluoric acid (HF) solution is devised to fabricate silicon nanowire (SiNW) arrays with dissolved oxygen acting as the one and only oxidizing agent. The key aspect of this strategy is the use of a graphite or other noble metal electrode that is electrically coupled with silicon substrate.

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