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Fabrication and Characterization of Solid State Nanopores using Field Emission Scanning Electron Beam

Authors
Type
Published Article
Journal
Applied Physics Letters
Publisher
American Institute of Physics
Publication Date
Mar 17, 2006
Volume
88
Issue
10
Identifiers
DOI: 10.1063/1.2179131
Source
LIBNA
License
Green

Abstract

The fabrication of solid-state nanopores using the electron beam of a transmission electron microscope (TEM) has been reported in the past. Here, we report a similar method to fabricate solid-state nanopores using the electron source of a conventional field-emission scanning electron microscope (FESEM) instead. Micromachining was used to create initial pore diameters between 50nm and 200nm, and controlled pore shrinking to sub 10nm diameters was performed subsequently during in situ processing in the FESEM. Noticeably, different shrinking behavior was observed when using irradiation from the electron source of the FESEM than the TEM. Unlike previous reports of TEM mediated pore shrinkage, the mechanism of pore shrinkage when using the FESEM could be a result of surface defects generated by radiolysis and subsequent motion of silicon atoms to the pore periphery. The authors acknowledge the support of the NASA Institute for Nanoelectronics and Computing (INAC) at Purdue under Award No. NCC 2-1363 for funding and supporting Hung Chang and Samir Iqbal, and by the U.S. DOE under Contract No. BES-MS W-31-109-Eng-38 for the work performed at ANL. The authors also want to acknowledge Ed Bagsell at Penn State University for electron beam lithography through the NSF-funded National Nanotechnology Infrastructure Network (NNIN). Partial wafer fabrication was performed at the University of Illinois at Chicago and at the Argonne National Labs (Dr. Derrick Mancini). The authors would like to express gratitude to Sara White and Bill Roth in Hitachi High Technologies America Inc. for valuable discussions.

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