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Epitaxy of Ge on offcut Si substrate for growth of In0.01Ga0.99As

Authors
  • Hu, Weixuan
  • Cheng, Buwen
  • Xue, Chunlai
  • Su, Shaojian
  • Liu, Zhi
  • Li, Yaming
  • Wang, Qiming
  • Cheng, B.([email protected])
Publication Date
Jan 01, 2011
Source
Knowledge Repository of SEMI,CAS
Keywords
License
Unknown
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Abstract

Epitaxy of Ge on offcut Si(001) for growth of In0.01Ga0.99As was studied. Anti-phase domains were prevented in In0.01Ga0.99As layer except on the In0.01Ga0.99As/Ge interface. Threading dislocations of Ge deteriorate the quality of In0.01Ga0.99As remarkably.?2011 IEEE.

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