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Enhancement of ZnO ultraviolet emission by surface plasmon coupling using a rough NiSi2 layer synthesized by ion implantation

Authors
  • Tan, Hairen
  • You, Jingbi
  • Zhang, Shuguang
  • Gao, Hongli
  • Yin, Zhigang
  • Bai, Yiming
  • Zhang, Xiulan
  • Zhang, Xingwang
  • Qu, Sheng
  • Tan, H.([email protected])
Publication Date
Jan 01, 2011
Source
Knowledge Repository of SEMI,CAS
Keywords
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Abstract

The calculation results of the surface plasmon(SP) energy and Purcell factor of ZnO/NiSi2 demonstrate the possibility of using NiSi2 to enhance the UV emission of ZnO by SP coupling. Experimentally, ZnO films were deposited on NiSi2 layers synthesized by ion implantation, and the roughness of the NiSi2 layers spans a large range from3 to38 nm, providing favorable conditions for investigating SP-mediated emission. An11-fold emission enhancement from the ZnO film on the roughest NiSi2 layer was obtained, which indicates the possibility that metal silicide layers can be used both as an electrical contact and for emission enhancement.?2011 Chinese Institute of Electronics.

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