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Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

Authors
  • Peter, Antony Premkumar;
  • Tomomi, Takayama;
  • Taishi, Ebisudani;
  • Eiichiro, Shiba;
  • Sepulveda, Alfonso;
  • Blanquart, Timothee;
  • Kimura, Yosuke;
  • Subramanian, Sujith;
  • Baudot, Sylvain;
  • Basoene, Briggs;
  • Gupta, Anshul;
  • Veloso, Anabela;
  • Capogreco, Elena;
  • Mertens, Hans;
  • Meersschaut, Johan; 9775;
  • Conard, Thierry;
  • Dara, Praveen;
  • Geypen, Jef;
  • Martinez, Gerardo;
  • Batuk, Dmitry;
  • And 2 more
Publication Date
Jul 01, 2021
Source
Lirias
Keywords
License
Unknown
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Abstract

status: published

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