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Effect of under-layer treatment of Ta/TaN barrier film on corrosion between Cu seed and Ta in chemical-mechanical-polishing slurry.

Authors
  • Lee, Wen-Hsi
  • Hung, Chi-Cheng
  • Wang, Yu-Sheng
  • Chang, Shih-Chieh
  • Wang, Ying-Lang
Type
Published Article
Journal
Journal of Nanoscience and Nanotechnology
Publisher
American Scientific Publishers
Publication Date
Jul 01, 2010
Volume
10
Issue
7
Pages
4196–4203
Identifiers
PMID: 21128400
Source
Medline
License
Unknown

Abstract

Tantalum/tantalum nitride (Ta/TaNx) composite film is widely used as a copper (Cu) diffusion barrier layer. In order to reduce via-resistance, an additional argon (Ar) re-sputtering process is used to thin the barrier thickness at the feature bottom. In this study, the effect of Ar re-sputtering of the under-layer of TaNx barrier films on the corrosion between Cu seeds and upper Ta films in chemical-mechanical-polishing (CMP) slurries was investigated. The results show that Ar re-sputtering of the under-layer of the TaNx barrier has a strong influence on the corrosion of Cu seeds and Ta films. The equivalent circuit, simulated using data from electrochemical analysis, reveals changes in resistance and capacitance elements of the Cu-Ta electrochemical system, proving that the phase transformation of upper Ta films under different TaNx conditions leads to different degrees corrosion of Cu seeds and the Ta films.

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