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Effect of Interface Roughness and Dislocation Density on Electroluminescence Intensity of InGaN Multiple Quantum Wells

Authors
  • Zhao, DG
  • Jiang, DS
  • Zhu, JJ
  • Liu, ZS
  • Zhang, SM
  • Wang, YT
  • Yang, H
Publication Date
Jan 01, 2008
Source
Knowledge Repository of SEMI,CAS
Keywords
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Abstract

Effects of interface roughness and dislocation density on the electroluminescence (EL) intensity of InGaN multiple quantum wells (MQWs) are investigated. It is found that the EL intensity increases with the number of satellite peaks in the x-ray diffraction experiments of InGaN MQW samples. It is indicated that the rough interface will lead the reduction of EL intensity of InGaN MQW samples. It is also found that the EL intensity increases with the decrease of dislocation density which is characterized by the x-ray diffraction measurements. It is suggested that the EL intensity of InGaN MQWs can be improved by decreasing the interface roughness and dislocation density.

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