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Molecular beam epitaxy grown GeSn p-i-n photodetectors integrated on Si

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
520
Issue
8
Identifiers
DOI: 10.1016/j.tsf.2011.10.111
Keywords
  • Gesn Epitaxie
  • Ge Photodetector
  • μ-Raman-Spectroscopy
Disciplines
  • Mathematics

Abstract

Abstract GeSn p-i-n photodetectors with a low Sn mole fraction made by molecular beam epitaxy on Si substrates show higher optical responsivities for wavelength λ>1400nm compared with p-i-n photodetectors made from pure Ge. The Sn incorporation in Ge is done by a low temperature growth step in order to minimize Sn segregation. The Sn incorporation and the alloy content are investigated by μ-Raman spectroscopy and calibrated Secondary Ion Mass Spectrometry. The photodetectors are manufactured with sharp doping transitions and are realized as double mesa structures with diameters from 1.5μm up to 80μm. The optical measurements are carried out with a broadband super continuum laser from λ=1200nm up to λ=1700nm. At a wavelength of λ=1550nm the optical responsivity of these vertical GeSn diodes is 0.1 A/W. In comparison with a pure Ge detector of the same geometrical dimensions the optical responsivity is increased by factor of three as a result of Sn caused band gap reduction.

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