Affordable Access

Publisher Website

Effect of rapid thermal annealing on the properties of spin-coated In–Zn–Sn–O films

Authors
Journal
Current Applied Physics
1567-1739
Publisher
Elsevier
Publication Date
Volume
13
Identifiers
DOI: 10.1016/j.cap.2012.12.015
Keywords
  • Rapid Thermal Annealing
  • In–Zn–Sn–O
  • Spin-Coating
  • Transparent Electrodes
Disciplines
  • Engineering

Abstract

Abstract We investigated the effect of rapid thermal annealing (RTA) on the electrical, optical and structural properties of In–Zn–Sn–O (IZTO) films prepared by spin-coating process using IZTO nanoink. By using conventional spin-coating process using IZTO nanoink, we could coat the IZTO film on a glass substrate under atmospheric ambient. At optimized RTA temperature of 700 °C and working pressure of 100 Torr under pure nitrogen ambient, we were able to obtain a spin-coated IZTO films with a sheet resistance of 45 Ω/square and transmittance of 81.62% at 550 nm wavelength. This indicates that the IZTO film prepared by simple spin-coating printing is a visible alternative to high cost sputtered-IZTO films and possibility of solution-based transparent electrode for cost-efficient solution based optoelectronic devices.

There are no comments yet on this publication. Be the first to share your thoughts.

Statistics

Seen <100 times
0 Comments