Affordable Access

Publisher Website

Effect of rapid thermal annealing on the properties of spin-coated In–Zn–Sn–O films

Authors
Journal
Current Applied Physics
1567-1739
Publisher
Elsevier
Publication Date
Volume
13
Identifiers
DOI: 10.1016/j.cap.2012.12.015
Keywords
  • Rapid Thermal Annealing
  • In–Zn–Sn–O
  • Spin-Coating
  • Transparent Electrodes
Disciplines
  • Engineering

Abstract

Abstract We investigated the effect of rapid thermal annealing (RTA) on the electrical, optical and structural properties of In–Zn–Sn–O (IZTO) films prepared by spin-coating process using IZTO nanoink. By using conventional spin-coating process using IZTO nanoink, we could coat the IZTO film on a glass substrate under atmospheric ambient. At optimized RTA temperature of 700 °C and working pressure of 100 Torr under pure nitrogen ambient, we were able to obtain a spin-coated IZTO films with a sheet resistance of 45 Ω/square and transmittance of 81.62% at 550 nm wavelength. This indicates that the IZTO film prepared by simple spin-coating printing is a visible alternative to high cost sputtered-IZTO films and possibility of solution-based transparent electrode for cost-efficient solution based optoelectronic devices.

There are no comments yet on this publication. Be the first to share your thoughts.

Statistics

Seen <100 times
0 Comments

More articles like this

Rapid thermal annealing effects on the structural...

on Superlattices and Microstructu... Jan 01, 2011

Effects of rapid thermal annealing on the structur...

on Applied Surface Science Jan 01, 2011

Effect of sputtering pressure and rapid thermal an...

on Transactions of Nonferrous Met... Jan 01, 2009
More articles like this..