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Design and implementation of an integral wall-mounted quartz crystal microbalance for atomic layer deposition.

Authors
  • Riha, Shannon C
  • Libera, Joseph A
  • Elam, Jeffrey W
  • Martinson, Alex B F
Type
Published Article
Journal
Review of Scientific Instruments
Publisher
American Institute of Physics
Publication Date
Sep 01, 2012
Volume
83
Issue
9
Pages
94101–94101
Identifiers
PMID: 23020393
Source
Medline
License
Unknown

Abstract

Quartz crystal microbalance (QCM) measurements have played a vital role in understanding and expediting new atomic layer deposition (ALD) processes; however, significant barriers remain to their routine use and accurate execution. In order to turn this exclusively in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of chemical vapor deposition (CVD) tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the utility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.

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