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Depth resolved structural study of heavy ion induced phase formation in Si/Fe/Si trilayer

Authors
  • Rajput, Parasmani1
  • Gupta, Ajay1
  • Meneghini, Carlo2
  • Avasthi, D. K.3
  • Darowski, Nora4
  • Zizak, I.5
  • Erko, A.5
  • 1 UGC-DAE Consortium for Scientific Research, University Campus, Khandwa road, Indore, 452017, India , Indore (India)
  • 2 Universitá di ‘Roma Tre’, Departmenotdi Fisica, Via della Vasca Navale 84, Roma, 00146, Italy , Roma (Italy)
  • 3 Aruna Asaf Ali Marg, Inter University Accelerator Centre, New Delhi, 110067, India , New Delhi (India)
  • 4 Hahn-Meitner-Institute, SF2 Magnetism, Glienicker str. 100, Berlin, 14109, Germany , Berlin (Germany)
  • 5 BESSY, A-Einstein-Strasse 15, Berlin, 12489, Germany , Berlin (Germany)
Type
Published Article
Journal
Hyperfine Interactions
Publisher
Springer Netherlands
Publication Date
Jul 01, 2008
Volume
185
Issue
1-3
Pages
9–15
Identifiers
DOI: 10.1007/s10751-008-9804-8
Source
Springer Nature
Keywords
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Abstract

Intermixing in Si/Fe/Si trilayer induced by 120 MeV Au ions has been studied. X-ray fluorescence provides information about the depth distribution of Fe atoms, while Mössbauer spectroscopy and XAFS provide information about the changes in the local structure. In the as-deposited film Fe layer is amorphous in nature with a significant Si content in it. Irradiation to a fluence of 1 ×1013 ions/cm2 results in formation of non-magnetic intermixed layer with its hyperfine parameter close to those of Fe0.5Si with CsCl structure. XAFS measurements under X-ray standing wave condition provide depth resolved structural information.

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