Defect-related emission characteristics of nonpolar m-plane GaN revealed by selective etching
- Authors
-
- wei, tb
- yang, jk
- hu, q
- duan, rf
- huo, zq
- wang, jx
- zeng, yp
- wang, gh
- jm, li
- Publication Date
- Jan 01, 2011
- Source
- Knowledge Repository of SEMI,CAS
- Keywords
-
- Cl
- Pl
- Stacking Fault
- Hvpe
- Gan
- Nonpolar
- Chemical-Vapor-Deposition
- Acceptor Pair Emission
- Phase Epitaxy
- Grown Gan
- Semiconductors
- Sapphire
- Films
- Nitride
- 半导体材料
- Chlorine
- Stacking Fault
- Chemical Vapor Deposition
- Atomic Layer Deposition
- Vapor-Plating
- Semiconductors
- Aluminum Oxide
- Photography--Films
- Finite Volume Method
- Nitrides
- Oxymuriatic Acid
- Cl
- Chlor
- Chlore
- Ci
- 堆垛层错
- Cvd (Chemical Vapor Deposition)
- Deposition, Chemical Vapor
- Vapor Deposition, Chemical
- Chemische Beschichtung Aus Dampfphase
- Revetement Chimique En Phase Vapeur
- Atomic Layer Epitaxial Growth
- Ale
- Mle Growth
- Molecular Layer Epitaxial Growth
- Chemical Beam Epitaxial Growth
- Cbe
- Gas Source Mbe
- Gsmbe
- Metalorganic Molecular Beam Epitaxy
- Mombe
- Ommbe
- Chemical Vapour Deposition
- Apcvd
- Cvd
- Laser Cvd
- Laser-Induced Cvd
- Lpcvd
- Chemical Vapour Infiltration
- Chemical Vapor Infiltration
- Cvi
- Crystal Growth From Vapour
- Laser Deposition
- Mocvd
- Metalorganic Chemical Vapour Deposition
- Movpe
- Omcvd
- Omvpe
- Molecular Beam Epitaxial Growth
- Mbe
- Migration-Enhanced Epitaxy
- Vapour Phase Epitaxial Growth
- Hot Wall Epitaxial Growth
- Vapor Phase Epitaxial Growth
- Vpe
- Cvi (Fabrication)
- Ald
- Molecular Beam Epitaxy
- Coulomb-Bethe
- Many-Body Expansion
- 真空镀膜
- Coating, Vacuum
- Deposition, Vapor
- Vacuum Coating
- Vacuum Metallizing
- Vapor Deposition
- Vapor-Phase Deposition
- Bedamfung
- Deposition De La Phase Vapeur
- Cvd (Deposition)
- Semiconducting Materials
- Semi-Conductors
- Crystalline Semiconductors
- Semiconductor Devices
- Semiconductor Alloys
- Space-Charge Limited Devices
- Halbleiter
- Semi-Conducteurs
- 蓝宝石
- Alumina
- Al<Sub>2</Sub>O<Sub>3</Sub>
- Bayer Process
- Aluminium Compounds
- Aluminum Compounds
- Sapphire
- Alumine
- Aluminiumoxid
- Oxyde D Aluminium
- Tonerde
- Saphir
- Sapphire (Francais)
- Aluminium Oxide
- Photographic Film
- Films
- Motion Pictures
- Movies
- Cinema
- Feature Films--History And Criticism
- Moving-Pictures
- Microfilms
- Filmstrips
- Film Slides
- Film Strips
- Slidefilms
- Anodised Layers
- Anodized Layers
- Claddings
- Cvd Coatings
- Chemical Vapor Deposited Coatings
- Chemical Vapour Deposited Coatings
- Cvd Thin Films
- Decorative Coatings
- Electrophoretic Coatings
- Fission Reactor Fuel Claddings
- Foils
- Mocvd Coatings
- Optical Fibre Cladding
- Optical Fiber Cladding
- Protective Coatings, Optical Fibre
- Plasma Arc Sprayed Coatings
- Plasma Sprayed Coatings
- Plasma Cvd Coatings
- Plasma Chemical Vapour Deposited Coatings
- Plasma Deposited Coatings
- Polymer Films
- Polymer Coatings
- Vacuum Deposited Coatings
- Vacuum Deposited Thin Films
- Vapour Deposited Coatings
- Vapor Deposited Coatings
- Vapor Deposited Thin Films
- Vapour Deposited Thin Films
- Elektrophoretische Ueberzuege
- Revetements Electrophoretiques
- Plasmalichtbogen-Spruehueberzuege
- Revetements Par Projection Au Plasma
- Motion Pictures (Entertainment)
- 有限体积法
- Art Films
- Cinefilms
- Moving Image Materials
- Nitride
- Nitrures
- License
- Unknown
- External links
