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Defect Curing Effects on High-k Gate Stack (Al/Al2O3/Si-sub) by Using H2 Plasma Treatment and Rapid Thermal Anneal

Authors
  • BAEK, ROCK HYUN
  • CHOI, KYEONG KEUN
  • KANG, BOHYEON
Publication Date
Jan 06, 2020
Source
[email protected]
License
Unknown
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