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A new hydro-fluorinated amorphous silicon produced by using intermediate species SiF2

Authors
Journal
Journal of Non-Crystalline Solids
0022-3093
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/0022-3093(83)90277-6

Abstract

Abstract Intermediate species SiF 2, mixed with H 2, is used instead of SiF 4 as the material gas for a hydro-fluorinated amorphous silicon (a-Si:F:H). The deposition rate can be easily increased up to about 20 Å/sec without apparent degradation of photo-conductive property by using intermediate species, and also, Si-F or Si-H single bond configuration becomes dominant although there apparently exist Si-H 2 or Si-F 2 higher order bonds in the film produced by using SiF 4.

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