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Annual Report 2008 Institute of Ion Beam Physics and Materials Research

Forschungszentrum Dresden
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Microsoft Word - 01-Titelblatt.doc W is se ns ch af tli ch -T ec hn is ch e Be ric ht e FZ D -5 12 2 00 9 · I SS N 1 43 7- 32 2X FZD-512 ANNUAL REPORT 2008 INSTITUTE OF ION-BEAM PHYSICS AND MATERIALS RESEARCH 5 nm [111] SiO2 Si [100] Wissenschaftlich-Technische Berichte FZD – 512 2009 Annual Report 2008 Institute of Ion Beam Physics and Materials Research Editors: J. von Borany, V. Heera, M. Helm, W. Möller Cover Picture: Graphically adapted nanosized cavity in Si with oxide grown at the inner surface, obtained after implantation of 45 keV He+ at a fluence of 4x1016 cm-² and 160 keV O+ at 1017 cm-², and subsequent annealing. The oxidation proceeds with different speed along the different crystalline directions, so that the originally spherical cavity is turned into a facetted precipitate. Depending on the available oxygen content and the annealing conditions, the cavity can be partly or completely filled with amorphous SiO2. For further information see: X. Ou et al., Appl. Phys. Lett. 93, 161907 (2008), reprinted at pp. 31-33 of this Annual Report. Forschungszentrum Dresden - Rossendorf e.V. Institut für Ionenstrahlphysik und Materialforschung Postfach 51 01 19 D-01314 Dresden Bundesrepublik Deutschland Direktoren Prof. Dr. Wolfhard Möller Prof. Dr. Manfred Helm Telefon + 49 (351) 260 2245 + 49 (351) 260 2260 Telefax + 49 (351) 260 3285 + 49 (351) 260 3285 E-mail [email protected] [email protected] Homepage Annual Report IIM 2008, FZD-512 3 Preface by the Directors The "Advanced Materials" program activities of Forschungszentrum Dresden-Rossendorf (FZD) are to a large fraction delivered by the Institute of Ion Beam Physics and Materials Research (IIM) in the fields of semiconductor physics and materials research using ion

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