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Equilibrium and nonequilibrium gap-state distribution in amorphous silicon

Authors
Publisher
The American Physical Society
Publication Date
Keywords
  • Conductivitat Elèctrica
  • Propietats Tèrmiques
  • Semiconductors Amorfs
  • Electric Conductivity
  • Thermal Properties
  • Amorphous Semiconductors

Abstract

A general and straightforward analytical expression for the defect-state-energy distribution of a-Si:H is obtained through a statistical-mechanical treatment of the hydrogen occupation for different sites. Broadening of available defect energy levels (defect pool) and their charge state, both in electronic equilibrium and nonequilibrium steady-state situations, are considered. The model gives quantitative results that reproduce different defect phenomena, such as the thermally activated spin density, the gap-state dependence on the Fermi level, and the intensity and temperature dependence of light-induced spin density. An interpretation of the Staebler-Wronski effect is proposed, based on the ''conversion'' of shallow charged centers to neutrals near the middle of the gap as a consequence of hydrogen redistribution.

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