Affordable Access

deepdyve-link deepdyve-link
Publisher Website

Characterization by medium energy ion scattering of damage and dopant profiles produced by ultrashallow B and As implants into Si at different temperatures

Authors
Publication Date
Identifiers
DOI: 10.1116/1.1477420
OAI: oai:epubs.cclrc.ac.uk:work/30258
Source
ePubs: the open archive for STFC research publications
Keywords
License
Unknown
External links

Statistics

Seen <100 times