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Nanoimprint lithography using IR laser irradiation

Authors
Journal
Applied Surface Science
0169-4332
Publisher
Elsevier
Publication Date
Volume
253
Issue
2
Identifiers
DOI: 10.1016/j.apsusc.2005.12.166
Keywords
  • Nanoimprint Lithography
  • Co2Laser
  • Plasma Treatment
  • Ribe
Disciplines
  • Design
  • Physics

Abstract

Abstract A new technique called “infrared laser-assisted nanoimprint lithography” was utilised to soften the thermoplastic polymer material mR-I 8020 during nanoimprint lithography. A laser setup and a sample holder with pressure and temperature control were designed for the imprint experiments. The polymer was spin coated onto crystalline Si <1 1 1> substrates. A prepatterned Si <1 1 1> substrate, which is transparent for the CO 2 laser irradiation, was used as an imprint stamp as well. It was shown, that the thermoplastic resist mR-I 8020 could be successfully imprinted using the infrared CW CO 2 laser irradiation ( λ = 10.6 μm). The etching rate of the CO 2 laser beam irradiated mR-I 8020 resist film under O 2 RF (13.56 MHz) plasma treatment and during O 2 reactive ion beam etching was investigated as well.

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