Affordable Access

Carbonization process of Si(100) by ion-beam bombardment

Authors
  • liao, my
  • chai, cl
  • yao, zy
  • yang, sy
  • liu, zk
  • wang, zg
Publication Date
Jan 01, 2001
Source
Knowledge Repository of SEMI,CAS
Keywords
License
Unknown
External links

Abstract

The evolution of carbonization process on Si as a function of ion dose has been carried out by mass-selected ion-beam deposition technique. 3C-SiC layer has been obtained at low ion dose, which has been observed by reflection high energy electron diffraction and X-ray photoelectron spectroscopy (XPS). The chemical states of Si and carbon have also been examined as a function of ion dose by XPS. Carbon enrichment was found regardless of the used ion dose here, which may be due to the high deposition rate. The formation mechanism of SiC has also been discussed based on the subplantation process. The work will also provide further understanding of the ion-bombardment effect. (C) 2001 Published by Elsevier Science B.V.

Report this publication

Statistics

Seen <100 times