Affordable Access

Quantitative Surface Chemical State Microscopy by X-ray Photoelectron Spectroscopy

Publication Date
  • Xps
  • Pca
  • Imaging
  • Chemistry


The realization of surface chemical-state microscopy by x-ray photoelectron spectroscopy requires theresolution of overlapped chemical states, an adequate background description and the ability to quantifydata. This can be achieved only by the acquisition and analysis of multi spectral data sets. Here wedescribe the software to perform this analysis, which is capable of allowing for small amounts ofdifferential charging and for incorporation of knowledge about the sample. We demonstrate its use ona patterned silicon dioxide on silicon sample, and suggest ways to reduce oversampling and thereforeacquisition times.

There are no comments yet on this publication. Be the first to share your thoughts.


Seen <100 times

More articles like this

Structure and chemical state of the Pt(557) surfac...

on Journal of the American Chemic... Aug 28, 2013

Surface and interface state analysis of the TPD/Al...

on Applied Surface Science Jan 01, 2004

On the chemical states of nitrogen on iron surface...

on Journal of Electron Spectrosco... Jan 01, 1977

Semi-quantitative surface analysis of Mt. St. Hele...

on Applications of Surface Scienc... Jan 01, 1981
More articles like this..