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Quantitative Surface Chemical State Microscopy by X-ray Photoelectron Spectroscopy

Publication Date
  • Xps
  • Pca
  • Imaging
  • Chemistry


The realization of surface chemical-state microscopy by x-ray photoelectron spectroscopy requires theresolution of overlapped chemical states, an adequate background description and the ability to quantifydata. This can be achieved only by the acquisition and analysis of multi spectral data sets. Here wedescribe the software to perform this analysis, which is capable of allowing for small amounts ofdifferential charging and for incorporation of knowledge about the sample. We demonstrate its use ona patterned silicon dioxide on silicon sample, and suggest ways to reduce oversampling and thereforeacquisition times.

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