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On the formation of amorphous Al2Pt phase in heat-treated multilayers and high temperature sequential deposition

Authors
Journal
Solid State Ionics
0167-2738
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/s0167-2738(01)00721-4
Keywords
  • Reactive Diffusion
  • Diffusion Coefficient
  • Amorphous Al2Pt
  • Differential Scanning Calorimetry
  • Tem
  • Nucleation

Abstract

Abstract It is shown that the solid-state reaction (SSR) taking place in multilayers during additional heat treatment, and the high temperature sequential deposition (HTSD) of the component materials are complementary techniques in studying the reactive diffusion. The formation of amorphous Al 2Pt phase has been analysed by these two techniques. The diffusion coefficients of Al in the amorphous phase, determined by these techniques, show good agreement. The nucleation and grain growth of amorphous compound phases have been proven for the first time.

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