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Submicron imprint of trench structures by external and intrinsic electromagnetic force

Authors
Journal
CIRP Annals - Manufacturing Technology
0007-8506
Publisher
Elsevier
Publication Date
Volume
59
Issue
1
Identifiers
DOI: 10.1016/j.cirp.2010.03.012
Keywords
  • Nano Manufacturing
  • Miniaturization
  • Submicron Imprint
Disciplines
  • Physics

Abstract

Abstract This paper describes a novel method for replication of submicron trench features by intrinsic electromagnetic imprinting force derived from the material made by mixing nanosize ferrite powders into ultraviolet-curable polymer, leading to the advantages of good uniformity and reduced structural deformation compared to mechanical nanoimprint methods. The features are fabricated to 0.5 μm wide and 0.2 μm high under the ultraviolet curing of 480 mJ/cm 2, imprinting cycle time of 30 s and pressure as low as 0.92 kg f/cm 2. The imprinting technique possesses the potential for fabrication of submicron magnetic features at room temperature across large area with high production rate and good pattern fidelity.

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